图片名称

Application status of plasma cleaning machine in industrial cleaning equipment

Keywords:

Published on:

01 Sep,2020

Application status of plasma cleaning machine in industrial cleaning equipment:

At present, there are three main types of industrial cleaning in the world, namely chemical cleaning, physical cleaning and biological cleaning. There are physical cleaning PIG technology cleaning, dry ice cleaning, ultrasonic cleaning, high-pressure water jet cleaning, plasma cleaning and other cleaning types. After years of research and practice, more and more users begin to look for and turn to physical cleaning methods. It can be said that physical cleaning technology is the development direction of world cleaning technology.

Plasma cleaning machine is one of the physical cleaning equipment. Its working principle is that the plasma cleaning machine USES gas as the cleaning medium, which effectively avoids the secondary pollution caused by the liquid cleaning medium to the cleaned objects. A vacuum pump is attached to the plasma cleaning machine, and the plasma in the cleaning chamber gently washes the surface of the object to be cleaned when working. The organic pollutants can be thoroughly cleaned in a short time after cleaning, and the pollutants can be removed by the vacuum pump, and the cleaning degree reaches the molecular level. In addition to the super cleaning function, the plasma cleaner can also change the surface properties of some materials according to the needs under certain conditions. The plasma ACTS on the surface of materials, making the chemical bonds of surface molecules recombine and forming new surface properties. For some materials with special purpose, the glow discharge of plasma cleaner not only enhances the adhesion, compatibility and wetting of these materials, but also disinfuses and sterilizes them during the supercleaning process. Plasma cleaner is widely used in the fields of optics, optoelectronics, electronics, material science, life science, polymer science, biomedicine, microfluidics and so on.

The application of plasma cleaning machine, originated in the early 20th century, with the rapid development of high-tech industry, its application is more and more widely, has been in many high-tech fields, in the status of the key technologies, plasma cleaning technology has a significant effect on industrial economy and industrial civilization, especially in the semiconductor and photovoltaic industry. Plasma cleaning machine has been used in the manufacture of various electronic components, we can be sure that, without the plasma cleaning machine and its cleaning technology, there would be no today so developed electronics, information and communication industries. In addition, the plasma cleaning machine and cleaning technology and application in the optical industry, machinery and aviation industry, polymer industry, industrial pollution prevention, control and measurement, and it is the key technology of product promotion, such as optical element coating, extend the life of the mold or machining tool abrasion resistance of the layer, the middle layer of composite material, weaving or recessive lens surface treatment, micro sensor smart, advanced mechanical processing technology, artificial joints, bones, or heart valve antifriction depletion are plasma technology progress, to complete the development. Plasma technology is a new field, the field combined with plasma physics, plasma chemistry and solid phase interface chemical reaction, this is a typical high-tech industries, across a variety of fields, including chemical, material and motor, so will be challenging, also full of opportunities, because of the fast development of semiconductor and photoelectric materials in the future have to leave the plasma cleaning.

Cleaning machine nearly 20 years of research and development and promotion application, has achieved more successful experience. At present, there are two main reactions between plasma and material surface, one is chemical reaction by free radical, the other is physical reaction by plasma, which will be explained in more detail below.

(1) Chemical reaction

Commonly used gases in chemical reactions include hydrogen (H2), oxygen (O2), carbon tetrafloride (CF4), etc. These gases react in the plasma to form highly active free radicals, which will further react with the material surface. The reaction mechanism is mainly to use the free radicals in the plasma to do chemical reaction with the material surface. When the pressure is high, it is more favorable for the generation of free radicals. Therefore, if the chemical reaction is to be the main one, it is necessary to control the high pressure to conduct the reaction.

(2) Physical reaction

Mainly the ions in the plasma is used as a purely physical collision, the material on the surface of the atoms or attached on the surface of the material out, because the ions in the average pressure is lower free radicals is lighter, the accumulation of a lot energy, when the physical impact, the ion energy is higher, the more some impact, so if you want to give priority to with physical reaction, we must control the reaction pressure down, so better cleaning effect. As semiconductor and photoelectric materials grow rapidly in the future, there will be an increasing demand for these applications.

Application status of plasma cleaning machine in industrial cleaning equipment

Hot Products

Related articles