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What is the difference between atmospheric plasma cleaning machine and vacuum plasma cleaning machine

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17 Aug,2020

What is the difference between atmospheric plasma cleaning machine and vacuum plasma cleaning machine:

Atmospheric plasma cleaning equipment, now most of the application is the mobile phone industry: mobile phone glass surface activation treatment, bottom glue before treatment, packaging front-end treatment, mobile phone shell surface activation treatment before painting. General mobile phone factory daily thousands to tens of thousands of capacity, it is necessary to have a fast and efficient activation process, atmospheric plasma cleaning machine is born for this. Whether fitted on a three-axis platform, transmission machine or installed on the whole line, the atmospheric plasma cleaning machine can quickly make one of the surface of the material to be processed to achieve a good activation effect. And vacuum plasma equipment it is its high performance, high quality, and high quality, and safety of product features, treatment effect comparison precision comprehensive, a lot of the material of the product itself, so cannot be used as the temperature of the atmospheric plasma equipment is relatively higher plasma device, this time can choose vacuum plasma equipment.

The differences are as follows:

1, because the atmospheric plasma nozzle is directly ejected the ion, this situation by the nozzle structure indirectly changed the direction of ion movement (directly facing the material being processed). Thus atmospheric plasma can only process one surface on the pipeline, which is also one of the differences with vacuum plasma cleaning. Vacuum plasma cleaning machine in the work, the ions inside the cavity is not directional, as long as the material in the cavity exposed part, no matter which side and which corner can be cleaned.

Second, in the use of gas, atmospheric plasma only need to access compressed air, of course, to better effect of direct access to nitrogen. The vacuum plasma cleaning machine will have more choices in gas, and can choose a variety of gases for matching material surface oxide, nanometer microorganism removal has a strong improvement. It should be emphasized here that the main purpose of the atmospheric type of gas is to activate and enhance the permeability. The purpose of vacuum gas is to enhance the etching effect, remove pollutants, remove organic matter, and enhance the erosion property. Obviously, the selection range of gas is wider and the vacuum plasma cleaning process will be more widely used.

3. Temperature. Although the temperature of the atmospheric plasma cleaning machine is about 60°-75° after several seconds of material processing, this data is measured according to the distance of the spray gun to the material is 15mm, the power is 500W, and the triaxial speed is 120mm/s. Of course, power, time of contact, and height of treatment all affect the temperature. Special attention is: atmospheric plasma cleaning machine spray gun work of the "flame" is divided into the internal flame and the external flame, when we clean are to take the external flame to wash, the internal flame in the nozzle inside, from outside is not visible. But it is easy to burn the surface if you do not move at a point for a long time in the presence of a "flame". Therefore, the temperature of atmospheric plasma can only be measured under the actual conditions.

The vacuum plasma cleaning machine is not so complex, according to the power frequency division, 40KHz and 13.56MHz for example: usually the material into the body to work, the frequency of 40KHz general temperature is below 65°, and the machine is equipped with a strong air cooler, the treatment time is not long, the surface temperature of the material will be the same as room temperature. Frequencies at 13.56MHz are lower, usually below 30°. Therefore, it is suitable to deal with some materials that are easily deformed by heat.

4. Ion generation conditions. It can be seen intuitively that the atmospheric type depends on the access gas, and the gas pressure needs to reach about 0.2mpa to produce ions. The vacuum type relies on the vacuum pump. Before ion production, the vacuum degree inside the cavity must be pumped below 25pA to produce ions, even if no external gas is connected.

What is the difference between atmospheric plasma cleaning machine and vacuum plasma cleaning machine

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