The difference of cleaning method of plasma cleaning machine
The difference of cleaning method of plasma cleaning machine:
Low temperature plasma equipment is also a dry cleaning method, and compared with the wet cleaning method, it has a simple process, controllable, and the product can achieve a clean, no residue purpose.
And the wet cleaning method, its disadvantage is likely to be a one-off wash not clean, will there be any residue, using plasma equipment for dry cleaning its reaction is in need of gas, the gas and we use most is non-toxic, and wet cleaning method many is to use a large amount of solvent, which also contains a lot of chemical composition, are harmful to human body, also can have influence on the environment.
In the process of plasma processing using plasma cleaning machine, it includes two cleaning processes, one is chemical reaction, the other is physical reaction.
Among them, the plasma cleaning machine based on chemical reaction has a very fast cleaning speed, good performance, high selectivity, in the removal of organic matters, oxides, and do surface activation have a very good effect.