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What are the use methods of semiconductor vacuum plasma cleaning machine

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02 Mar,2021

What are the use methods of semiconductor vacuum plasma cleaning machine:
Semiconductor vacuum plasma cleaning machine is a kind of advanced high-tech equipment, cleaning is the use of plasma activation modified etching, improve adhesion effect such as equipment, when used, must be operated in accordance with the requirements of the specification, and some of them use method also need to know what are the knowledge, today will give you the concrete introduce.

CRF vacuum plasma cleaning machine
In the vacuum operation of semiconductor vacuum plasma cleaning machine, we must make the three-way valve pointing to the closed state, that is to say, let the arrow down, and then open the power supply of the vacuum pump, see if the rotation direction of the vacuum pump is clockwise or counterclockwise, if it is clockwise, it is normal, after the detection is completed, and then turn off the power supply.


Before starting the vacuum pump, make sure that the vacuum plasma cleaner is connected to the vacuum pump. At this time, the plasma is in the closed state and the plasma chamber will glow after starting. In the pumping, to open the three-way valve, so that it is connected with the indoor air, and then in the needle valve open, pay attention to gently open, let the air slowly into the vacuum plasma cleaning machine cabin, the formation of plasma, and then the front of the control panel power on. During the plasma treatment, the sample should be processed according to the required time. After the treatment, the sample should be closed in RF and cleaned.
With semiconductor vacuum plasma cleaning machine, it can be reference to the above content, only the correct operation, does not failure, in addition, after the cut off power supply, also check the plasma cleaning machine after the insurance tube is normal in the safe power supply edge, any traces of the burn out, if there is damage, must change the new matching insurance tube.

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