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Plasma cleaner plasma cleaning machine

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Published on:

04 Jan,2021

Plasma cleaner plasma cleaning machine:

 

Plasma cleaning machine dry cleaning, cleaning is a common concept in the electronic industry, it involves a process level, related to the removal of pollution sources, different parts of the cleaning method is different. In recent years, physical cleaning and chemical cleaning are widely used in mechanical manufacturing industry. According to the cleaning purposes, it can be divided into wet cleaning and dry cleaning. Plasma plasma plasma dry cleaning has been widely used in the industrial production of electronic products.

 

The key to wet cleaning is to use the effect of physical and chemical (organic solvent), such as adsorption, penetration, decomposition, separation, etc. to remove dirt with the physical properties of ultrasonic wave, spray, rotation, mechanical vibration, etc. This kind of cleaning function and application field are different, the cleaning effect is also different to some extent.

 

In the past, chlorofluorocarbons (CFCS) play a key role in cleaning efficiency and post-treatment, but they are limited by their damage to the ozone layer of atmospheric environment. Compared with the alternative technology, cleaning stage inevitably need to dry in the late (ODS cleaning does not need to be dry, but it will destroy the atmospheric ozone layer, limited use) and waste water treatment, need a lot of money for product safety in production, especially cleaning process of electronic components, precision machinery and equipment of high-speed development puts forward higher standards on cleaning process, pollution to air environment management has increased the investment cost of wet cleaning.

 

Plasma cleaning plasma dry cleaning has a considerable competitive advantage in this aspect, especially the cleaning process of plasma cleaning machine has been used in semiconductor materials, electronic devices, precision machinery and other manufacturing industries. Unlike wet cleaning, the basic principle of plasma cleaning is to remove contaminants from the surface by means of "activation" of plasma components. In terms of various cleaning methods, plasma cleaning is a thorough stripping cleaning method, a good way of environmental cleaning.

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