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Plasma cleaning and UV light cleaning

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Published on:

23 Sep,2020

Plasma cleaning and UV light cleaning:

Plasma introduction and its principles

Plasma:

Plasma is a form of matter composed mainly of free electrons and charged ions. It exists widely in the universe and is often regarded as the fourth state of matter, which is called plasma state, or "supergas", also known as "plasma". The e natural presence of plasma, including lightning and the Northern lights, is made up of electrons, ions, free radicals, neutral particles, and photons. The e plasma itself is an electrically neutral mixture of physically and chemically active particles. These active free radical particles can do chemical work, while charged atoms and molecules can do physical work by sputtering. Through physical bombardment and chemical reaction, plasma process can complete surface modification of various materials, including surface activation, pollutant removal, etching and other functions.

Plasma technology:

Removal of organic contaminants from metals, ceramics, and plastics to improve adhesion. Because glass, ceramics, and plastics are essentially non-polar, they require surface activation treatment prior to bonding, painting, and coating. Through surface activation, etching and surface deposition, plasma technology can improve the properties of most substances: cleanliness, hydrophilicity, adhesion, lubricity, wear resistance and so on.

Principle of plasma cleaning:

To a group of electrodes with radio frequency voltage (frequency is about a few MHZ), high frequency alternating electric field, formed between the electrode area gas under the ferment of alternating electric field, the formation of plasma, and the activity of plasma to be dual role, conduct physical bombardment cleaning and chemical reaction, make the surfaces to be cleaned substances into particles and gaseous substances, after discharge, vacuum cleaning and to achieve.

Comparison between Plasma cleaning and UV light cleaning:

different categories	PLASMA cleaning	UV light cleaning
cleaning method	chemical + physical	oxidation reaction
adaptive range	treated with a variety of substrates	not suitable for oxides
energy	big	small
after cleaning	no damage	no damage
cleaning effect	better	good
reliability	high	high
surface cleaning uniformity	higher	consistent
surface modification	good	good