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The five advantages of Chengfeng Zhizhi plasma cleaning equipment are reflected

The five advantages of Chengfeng Zhizhi plasma cleaning equipment are reflected

The five advantages of Chengfeng Zhizhi plasma cleaning equipment are reflected: Chengfeng Zhizhi plasma cleaning equipment can be used for nano-level surface cleaning and sample activation. It is a small, non-destructive ultra-cleaning equipment. The plasma cleaning equipment uses gas as the cleaning medium, which effectively avoids the secondary pollution caused by the liquid cleaning medium to the objects to be cleaned. In addition to the super-cleaning function, the plasma cleaning equipment can also change the surface properties of certain materials as needed under special conditions: plasma acts on the surface of the material to recombine the chemical bonds of surface molecules to form new surface characteristics. For some special-purpose materials, the glow discharge in the ultra-cleaning process not only enhances the adhesion, compatibility and infiltration of these materials, but also can be sterilized. Chengfeng Zhizhi plasma cleaning equipment has a wide range of applications in the fields of optics, optoelectronics, electronics, materials, life sciences, polymer sciences, biomedicine, and microfluidics. The main advantages of Chengfeng Zhizhi plasma cleaning equipment are: 1. If you use a plasma cleaning machine to clean the items, the items will remain in a dry state after the cleaning is completed, so you don’t need to send the items directly to the next process during the drying process, which is still very convenient and greatly improved Improve the efficiency of the entire assembly line. 2. In addition, the plasma cleaning equipment allows employees to operate remotely, so employees' safety issues can also be avoided. 3. Due to the use of high-frequency plasma, it can penetrate deep into the object to complete the corresponding cleaning task. Compared with the general cleaning machine, it still has great advantages. No matter what shape the object is, it can be cleaned. , And the cleanliness is also very good. 4. Use it to clean the surface of the material. Generally, there is no need to transport and discharge the cleaning liquid, so it also guarantees the environmental protection of the cleaning environment to a large extent. In addition, it also saves a certain amount of handling and post-processing to a certain extent. Human and material resources. This will further improve the cleaning efficiency of the overall items. 5. The plasma cleaning equipment made by Chengfeng Zhizhi is a brand new high-tech, which uses plasma to achieve effects that cannot be achieved by conventional cleaning methods. It uses the properties of these active components to perform surface treatment on the sample, so as to achieve the purpose of cleaning, coating, modification, and photoresist ashing.

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Comparison of the advantages and disadvantages of the wet and dry etching methods

Comparison of the advantages and disadvantages of the wet and dry etching methods

Comparison of the advantages and disadvantages of the wet and dry etching methods: The wet cleaning system is suitable for advanced non-destructive megasonic cleaning. It can be used to make easily damaged substrates with or without patterns, including templates with protective films. In order to achieve a good cleaning effect while ensuring that the substrate is not damaged, the megasonic energy density must be kept slightly below the damage threshold at any position on the sample. The wet etching technology makes the surface acoustic energy of the substrate evenly distributed, increases the distributed energy to support ideal cleaning, and ensures that it is within the damage threshold of the sample. The system has high repeatability, good uniformity, Z-level advanced megasonic cleaning function, and megasonic assisted photoresist stripping and wet etching functions. The product can be subjected to non-destructive testing, chemical reagent cleaning, brush cleaning, drying, etc. according to the process steps. Comparison of the advantages and disadvantages of the two wet and dry etching methods: The wet etching system is an etching method in which the chemical reaction between a chemical etching solution and the object to be etched makes it peel off. Wet etching is mostly isotropic etching, which is not easy to control. Features: Strong adaptability, uniform surface, little damage to silicon wafers, suitable for almost all metals, glass, plastics and other materials. Disadvantages: The drawing quality is not ideal, and the small lines in the drawing are difficult to grasp. The etching medium of the dry etching system is plasma, which uses plasma to react with the surface film to generate volatile substances, or directly bombard the surface of the film to etch it. Characteristic: It can realize anisotropic etching to ensure the fidelity of the image after the detail conversion. Disadvantages: the cost is average, and the preparation of microfluidic chips is less. The dry etching system includes: a cavity for accommodating plasma; a quartz disk above the cavity; a plurality of magnets above the quartz disk; A magnetic field where the magnets rotate together. By further increasing the collision frequency of the particles, a better plasma uniformity can be obtained and the plasma concentration can be increased.

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Plasma surface modification of bast fiber in atmospheric plasma cleaning equipment

Plasma surface modification of bast fiber in atmospheric plasma cleaning equipment

Plasma surface modification of bast fiber in atmospheric plasma cleaning equipment: During the plasma treatment of fibers and polymers by the atmospheric plasma cleaning equipment, the high-energy particles and photons generated by the plasma interact violently with the surface of the substrate, and this interaction usually manifests as a free radical chemical reaction. Generally, four surface effects can be observed, namely, surface cleaning, surface etching, molecular cross-linking near the surface, and changes in surface chemical structure. To a certain extent, each effect may exist, but one of the effects may be more obvious than others, depending on the processing object, the chemical properties of the gas, and the instrument model and the settings of the instrument parameters. Several surface effects, alone or in synergy, will affect the adhesion of the processed object. Plasma treatment of atmospheric plasma cleaning equipment has a very good effect on improving the bonding strength between polymer and fiber and between polymer and polymer. The increase in adhesion after plasma treatment is due to the increase in the wettability of the substrate and the change in the chemical structure of the polymer surface after treatment. The gas generates a plasma medium under the coupling action of electromagnetic force. This plasma medium contains ions, electrons, neutrons, photons, free radicals, metastable excited particles and molecules, and dynamic mixing at room temperature. Plasma treatment can make The surface of fibers and textiles is functionalized without affecting their overall performance. Under the action of electromagnetic field, these plasma particles diffuse into the surface of the fabric substrate in a gradient, resulting in a variety of general surface treatments, including surface activation of active sites due to bond breakage, grafting of chemical structures and functional groups, and material volatilization Removal (etching), surface contaminants or layer dissociation (cleaning), and deposition of conformal coatings, etc. The electron collision and photochemical molecular separation of atmospheric plasma cleaning equipment will generate plasma containing high-density free radicals, which can cause the chemical bonds on the surface of the fiber polymer to break, thereby forming new chemical substances on the surface of the fiber polymer. This will lead to changes in the chemical structure and morphology of the fiber surface. The specific surface area of ​​the fiber will increase significantly. Plasma treatment on the surface of fibers and polymers will lead to the production of new functional groups such as hydroxyl (-OH), aldehyde (-CHO) and carboxyl (-COOH), which affect the moisture absorption of the fabric and facilitate the grafting of molecules deal with. The unique physical and chemical properties and temperature range characteristics of plasma. Make it an effective tool for surface treatment of materials. The low-temperature plasma treatment of atmospheric plasma cleaning equipment can improve the dyeing rate, dye uptake and color yield of linen fabrics. The etching and oxidation of the hemp fiber surface reflects the effect of plasma treatment. For fiber products with low color fastness, low-temperature plasma dyeing can be considered. Satisfactory dyeing results can usually be obtained. Plasma treatment can achieve effects that cannot be achieved by conventional treatment. Plasma can only act on the surface of the substance (the upper layer) instead of the entire material. The high cost of the treatment process can be repaid by high value-added products. The application space of plasma technology is huge. Generally speaking, the development of plasma technology in the industrial revolution is relatively slow, but it can develop steadily.

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What are the steps involved in the wet etching system

What are the steps involved in the wet etching system

What are the steps involved in the wet etching system: The wet processing system provides a controllable chemical dripping capability, which further enhances the ability to remove particles from the surface of the substrate. At the same time, both SWC and LSC have a drip test system, which can greatly save the amount of chemical reagents. The dispensing system supports programmable chemical reagent mixing capabilities to control the distribution of chemical reagents on the entire substrate. Provides high repeatability, high uniformity and advanced megasonic cleaning, megasonic assisted photoresist stripping, and wet etching system. Wet etching is a commonly used chemical cleaning method. Its main purpose is to correctly copy the mask pattern on the surface of the silicon wafer to the glued silicon wafer, so as to protect the special area of ​​the silicon wafer. Since the start of semiconductor manufacturing, silicon wafer manufacturing has been closely related to wet etching systems. The current wet etching system is mainly used to remove residues, float to remove silicon, large-scale pattern etching, etc. It has the advantages of simple equipment, high material selection ratio, and less damage to devices. The wet etching process has the advantages of low temperature, high efficiency, and low cost. During the wet etching process, the phosphosilicate glass and metal ions on the silicon wafer can be effectively removed, and the passivation and cleaning can be completed at one time to remove impurities. Thereby improving the use efficiency of silicon wafers. The wet etching system is an etching method that peels off the etched object through a chemical reaction between a chemical etching solution. Most wet etching systems are isotropic etching that is difficult to control. Features: Strong adaptability, uniform surface, little damage to silicon wafers, suitable for almost all metals, glass, plastics and other materials. Disadvantages: The fidelity of the drawing is not ideal, and the drawing minimum line is difficult to grasp. Wet etching is a technique in which etching materials are immersed in an etching solution for etching. In short, it is the concept of chemical solution etching in middle school chemistry class. It is a pure chemical etching with excellent selectivity. It stops after etching the current film without destroying other materials below. film. Semiconductor wet etching systems are all isotropic etching, so for the etching of the oxide layer and the metal layer, the width of the horizontal etching is close to the vertical etching depth. In this way, the pattern on the upper photoresist and the pattern on the lower material will have a certain deviation, so that the work of pattern transfer and replication cannot be completed with high quality. Therefore, as the feature size decreases, in the process of pattern transfer Basically no longer used.

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Plasma plasma cleaning machine is used in the bonding technology of the material surface treatment process

Plasma plasma cleaning machine is used in the bonding technology of the material surface treatment process

Plasma plasma cleaning machine is used in the bonding technology of the material surface treatment process: The plasma plasma cleaning machine can be applied to various common printing processes, such as pad printing, screen printing, offset printing and other materials in the process flow. The application principle is to use plasma pretreatment technology to make low-viscosity screen printing inks, such as polypropylene, polyethylene, polyamide, polycarbonate, glass or metal materials, difficult to adhere to the surface, and the adhesion time is longer . Due to the high efficiency of plasma technology of plasma plasma cleaning machine, it has also promoted the improvement of product packaging printing speed. For example, pretreatment of some packaging products before packaging printing can increase the packaging printing rate by 30%. A perfect surface pretreatment is a necessary condition to ensure the quality of the later coating process. The plasma plasma cleaner can provide this function. For many companies, from the perspective of the production process, the key stage of their processing is the energy-saving and environmentally-friendly water-based coating process. And the use of atmospheric pressure plasma preparation and treatment process to make the water-based coating process possible. Plasma treatment can remove grease and dust on the surface and give higher energy to the surface of the material. Plasma pretreatment technology has the effect of removing grease on the surface layer, and the de-static gravity of plasma removes dust particles sticking to the surface layer. As a pre-printing process, plasma pretreatment promotes the durability of solution inks. Sexual adhesion improves the production quality of packaging printing, enhances the durability of packaging printing products, anti-aging, and makes the color more beautiful, and the pattern packaging printing is better. Compared with corona treatment, if a uniform plasma is used to treat the surface of the heat-sensitive material, it will not cause other hazards to the surface. At the same time, the influence of chemical changes further enhances the surface energy. The comprehensive effect of this level promotes the plasma preparation process to become a kind of high-efficiency special tools. Under normal circumstances, plasma pretreatment by plasma plasma cleaning machine does not need to be performed. Other cleaning process and primer treatment. The use of plasma plasma cleaning machine can complete reliable and durable adhesive connection. The tough and durable bonding performance between plastic materials can be attributed to the high activation performance of plasma surface treatment. In addition to the use of bonding in the plastic center, plasma plasma cleaning machine technology has long been successfully applied to structural bonding in the process of parts and equipment. For example, in the automobile industry, the bonding surface of the heat pipe radiator and the truck body is plasma pretreated. After plasma pretreatment, no additional cleaning or other pretreatment processes are required. Plasma technology can ensure high bonding strength.

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What role does the low-temperature plasma cleaning machine play in the production and manufacture of power lithium batteries

What role does the low-temperature plasma cleaning machine play in the production and manufacture of power lithium batteries

What role does the low-temperature plasma cleaning machine play in the production and manufacture of power lithium batteries: Power lithium battery is a commonly used lithium battery powered by pneumatic tools. This is a clean and environmentally friendly drive power supply. In today's application scenarios, it is widely used in pure electric vehicles, electric trains, electric vehicles and golf carts. In recent years, with the rise of the new energy vehicle sales market, the safety and reliability of power lithium batteries has become a topic of concern and discussion. The reason is not only that the power lithium battery is a key component of the power drive system software, but also that the power lithium battery production process itself has high reliability and reliability requirements. Taking automobile lithium batteries as an example, what role can low-temperature plasma cleaning machines play in the manufacturing process of power lithium batteries? What assistance can be provided for them? In the production process of automobile power lithium battery, the surface treatment of low-temperature plasma cleaning machine is generally carried out from three levels, that is, to improve the lubrication performance of the ceramic film before coating the positive and negative plates; to clean the connecting piece before lithium electric welding; and Improve the surface adhesion of insulating plates, end plates, PET plastic films and other metal composite materials and their insulating materials before external gluing of their lithium battery components. 1. Low-temperature plasma cleaning machine solves the problem of positive and negative two-stage coating before ceramic membrane plasma cleaning machine: The positive and negative stages of the power lithium battery for automobiles are made according to the positive stage of the ceramic film and the battery cathode material. Compared with cleaning with ethanol and other aqueous solutions, plasma cleaning machine treatment will not damage the material itself, and can remove organic matter on the surface of the raw material, improve the lubricity of the film surface, and improve the uniformity, heat resistance and safety factor of the coating. 2. Plasma cleaning before welding: The lithium tab actually refers to the part between the positive and negative stages of the metal material strip that correctly guides the rechargeable battery. It is a point contact type during battery charging and charging and discharging. Whether the surface of the connecting piece is clean or not has a great hazard to the reliability and performance of the electrical connection. Treatment with a plasma cleaner before electric welding can remove organic matter, particles and other residues on the surface of the weld, make the surface of the weld uneven, and improve the quality of steel lap welding. 3. Low-temperature plasma cleaning machine to process the raw rubber of lithium battery components: The lithium battery assembly process is to connect several rechargeable battery modules in series into a series of parallel circuits to produce a lithium battery pack. In order to maintain the safety of the power supply circuit and the insulation layer, during this process, a rechargeable battery must be attached to the outside to improve the safety factor of the application. Prior to this, please use a plasma cleaning machine to clean the insulating plates, end plates, PET film and other parts. Plasma treatment can thoroughly clean the dirt surface, make the surface matte, and improve the adhesion of super glue or super glue.

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