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Difference advantage between dry plasma cleaning and wet cleaning

Difference advantage between dry plasma cleaning and wet cleaning

CRF plasma cleaning is the use of working gas under the action of electromagnetic fields to excite the plasma and the surface of the object to produce physical and chemical reactions, so as to achieve the purpose of cleaning. Wet cleaning is the use of chemical solvent or water in a certain period of time to clean the object, in order to achieve the purpose of cleaning. Plasma cleaning is the use of different gases for object treatment cleaning, no waste, its gas can be directly discharged into the atmosphere through the vacuum system and neutralizer after treatment, health, environmental protection, benefit, safety. Compared with plasma cleaning, wet cleaning tends to produce a large amount of waste and chemical gas, which is not conducive to health and environmental safety. Recently, the customer mentioned that the use of plasma cleaning equipment caused sputtering damage on the material surface. In fact, as long as the energy control is appropriate, mild surface damage can enhance the adhesion of the workpiece itself. In some cases, plasma cleaning treatment becomes an indispensable process. For example, Ar plasma is used to remove surface oxides of some materials. Of course, some process tests have shown that this kind of damage can be minimized by using a step-by-step process for cleaning. In addition, we believe that wet cleaning will be more harmful to materials beyond control, and plasma cleaning treatment is more worthy of application. In addition, the toxicity of plasma cleaning residues has been studied deeply at home and abroad. With its advantages in health, environmental protection, benefit and safety, the plasma cleaning equipment and process gradually replace the wet cleaning process, especially in the precision parts cleaning and new semiconductor materials research and integrated circuit device manufacturing industry, the plasma cleaning application prospect is broad.

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Vacuum plasma cleaning machine seal role

Vacuum plasma cleaning machine seal role

A vacuum plasma cleaning machine quality and reliability of the good or bad, can you meet our requirements, usually watch a few parts of the machine, such as vacuum pump, plasma generator and other core components, and there are some not clear place or inside the machine panel if choose inappropriate or failure, for the operation of the vacuum plasma cleaning machine is also very important. Today we will discuss the importance of seals in vacuum plasma cleaning machine components. In the vacuum plasma cleaning machine components, the role of sealing seals is particularly important, about the choice of seals, directly affect the normal operation of the machine. When we know what seals do, we will start to choose seals. There are three types of seals on the market, one is the O-ring seal, one is the pipe bracket seal, and one is the sealing gasket. What parts of the vacuum plasma cleaning machine are these seals applied to? 1. O-ring seals used in vacuum plasma cleaning machine: The O-ring is composed of a low-friction filled polytetrafluoroethylene (PTFE) ring and an O-ring made of rubber. The O-ring provides sufficient seal pretension and compensates for the wear of the PTFE ring. O-ring seals are mainly used in vacuum plasma cleaning machine to seal the parts connected with vacuum chamber and other parts, such as the sealing between vacuum chamber and vacuum door, between feed electrode and vacuum chamber, and between vacuum chamber and vacuum pipeline, etc. 2. Pipeline bracket seals used in vacuum plasma cleaning machine: The main advantage of pipeline bracket seals is that they are very simple to install without using tools. Good sealing performance. At the same time in the vacuum plasma cleaning machine mainly used in the connection between the vacuum pipeline. It is a common sealing way between pipelines by squeezing the vacuum clamp and making the pipeline clamp the sealing element of pipeline bracket. 3. Sealing gasket used in vacuum plasma cleaning machine: Sealing gasket is mainly used in fluid machinery and equipment, used for part of the equipment and parts of the connection and so on the vacuum plasma cleaning machine is used by oil resistant rubber asbestos gaskets, oil resistant asbestos rubber gasket is made of asbestos fiber, oil resistant, filling material, such as colorants, it has good oil resistance, heat resistance and sealing, mainly used in the vacuum plasma cleaning machine, vacuum pump body.

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Rubber and plastic industry dedicated plasma surface treatment equipment

Rubber and plastic industry dedicated plasma surface treatment equipment

Because polypropylene, PTFE and other plastic materials are non-polar, and without surface treatment, the printing, bonding, coating and other processes do not have any impact, therefore, in industrial applications, some plastic products surface bonding difficulties will occur. Some chemical agents are used in the production process to treat the surface of these rubber and plastic materials, so as to change the adhesive effect, but this method is difficult to master, the chemical agent itself is toxic, the operation is very complicated, the cost is high, and the chemical agent has an impact on the original excellent performance of rubber and plastic materials. Using plasma surface treatment technology, under the bombardment of high speed and high energy plasma, the surface performance of the material can be maximized, and an active film can be formed on the surface of the material, so that rubber and plastic can be printed, bonded, coated and other operations. Plasmas technology is used for surface treatment of rubber products, with simple operation, no harmful substances before and after treatment, good treatment effect, high production efficiency and low cost.  

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The influence factors of plasma cleaning effect

The influence factors of plasma cleaning effect

1. Principle and Implementation Method: Plasma cleaning can remove surface stains by means of physical shock (such as argon plasma) or chemical reaction (oxygen plasma) caused by the impact of high-energy particles in a specific material plasma on the surface of the object that needs cleaning. At present, most plasma cleaning systems obtain the plasma by lowering the reaction chamber pressure to 100Pa, then pumping in the appropriate gas at a certain speed and powering up. 2. Main factors affecting the cleaning effect: (1) Influence of electrode on plasma cleaning effect: The design of the electrode has a significant influence on the plasma cleaning effect, mainly including the material, layout and size of the electrode. For inner electrode plasma cleaning system, because the electrode exposed in plasma, some materials of electrode are some plasma etching or sputtering phenomenon occurs, causing unnecessary pollution and lead to changes in the size of the electrode, which affect plasma cleaning has a great influence on the speed and uniformity, the small electrode spacing can limit plasma in a small area to get a high density plasma, achieve faster to clean. With the increase of spacing, the cleaning speed decreases gradually but the uniformity increases gradually. The size of the electrode usually determines the overall capacity of the plasma system. In the plasma cleaning system with parallel electrode distribution, the electrode is usually used as a tray. The larger electrode can clean more components at one time to improve the operating efficiency of the equipment. (2) Influence of working pressure on plasma cleaning effect: Work pressure is one of the important parameters of plasma cleaning, the increase of the pressure means the increase of plasma density and the average energy of the particles is reduced, the plasma chemical reaction as the leading, enhanced density plasma system can obviously improve the cleaning speed, and physical bombardment dominate the effect of plasma cleaning system is not obvious. In addition, changes in pressure may cause changes in plasma cleaning reaction mechanism. For example, the CF4/O2 plasma used in silicon wafer etching process plays a dominant role when the pressure is low, while with the increase of pressure, the chemical etching is constantly strengthened and gradually plays a dominant role. (3) Influence of power and frequency on plasma cleaning effect: The power of the power source influences all plasma parameters, such as the temperature of the electrode, the self-bias generated by the plasma and the cleaning efficiency. With the increase of the output power, the plasma cleaning speed gradually strengthened and stabilized at a peak value, while the self-bias voltage increased with the increase of the output power. Since the power range is basically constant, frequency is the key parameter that affects the plasma self-bias. With the increase of frequency, the self-bias decreases gradually. In addition, with the increase of frequency, the density of electrons in the plasma increases gradually, while the average energy of particles decreases gradually. (4) Influence of working gas selection on plasma cleaning effect: The selection of process gas is a key step in the design of plasma cleaning process. Although most of the gas or gas mixture can remove pollutants in many cases, the cleaning speed can vary several times or even dozens of times. For example, adding different proportions of sulfur fluoride (SF6) in oxygen (O2) to clean plexiglass as a process gas can greatly improve the cleaning speed.

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Principle and composition of vacuum plasma cleaning machine

Principle and composition of vacuum plasma cleaning machine

Vacuum plasma cleaning machine is composed of vacuum generation system, electrical control system, plasma generator, vacuum chamber and related machinery. The vacuum plasma cleaning machine can be customized according to the requirements of customers. Vacuum plasma cleaning machine USES two electrodes to form electromagnetic field, vacuum pump to achieve effective vacuum degree, as the gas is more and more thin, the distance between molecules and molecules or ions free movement distance is also more and more long, the impact of magnetic field and the formation of plasma and produce glow. The plasma moves in space within the electromagnetic field and bombards the surface of the treated object continuously to remove surface oil, surface oxides, ashing surface organics and other chemicals, so as to achieve the effect of surface treatment cleaning and etching. Vacuum ion cleaning machine is widely used in surface decontamination and plasma etching and teflon (PTFE) and the mixture of PTFE etching, plastic, glass, ceramic surface activation and cleaning, such as plasma plating, polymerization process, therefore widely used in automobile industry, electronics, military electronics, PCB industry made high precision. The whole cleaning process of vacuum plasma cleaning machine is roughly as follows: 1. First, feed the cleaned workpiece into the vacuum machine and fix it, start the operating device and start exhaust, so that the vacuum degree in the vacuum chamber can reach the standard vacuum degree of about 10Pa. The average exhaust time is about a few minutes. 2. Then introduce the gas used for plasma cleaning into the vacuum chamber, and keep the pressure in the chamber stable. According to the different cleaning materials, oxygen, argon, hydrogen, nitrogen, carbon tetrafluoride and other gases can be used respectively. 3, indoor vacuum high-frequency voltage applied between the electrode and the grounding device, make the gas be breakdown and occurred by glow discharge plasma ionization and, let the plasma generated in a vacuum chamber in processed workpiece and start cleaning, washing processing last a few seconds to tens of minutes, according to different processing of materials. 4. After the cleaning, cut off the power supply, and pump out the gas and gasified dirt through vacuum pump, and the cleaning is finished. Vacuum plasma cleaning machine has many advantages: such as the use of numerical control technology automation degree; With high precision control device, high time control precision; Correct plasma cleaning will not produce damage layer on the surface, so the surface quality can be guaranteed. The cleaning work is carried out in a vacuum environment. The cleaning process is environmentally safe and does not pollute the environment, and the cleaning surface is effectively guaranteed not to be contaminated by secondary pollution.

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Cable plasma processor improves cable code adhesion

Cable plasma processor improves cable code adhesion

In recent years, with the increase of the market demand for special cables and the wide application of new insulating materials such as crosslinked polyethylene, fluoroplastics and nylon, the surface of the cables made of these materials is very smooth, which leads to the phenomenon of code spraying on the wires and cables and the characters falling off and wiping off. In order to solve this problem, some cable users have tried to improve the ink adhesion method to solve this problem, but the high adhesion of the ink not only cannot achieve good anti-wiping effect, and will cause the printer fault rate is high, expensive imported ink and other problems. Cable pre - printing treatment, wire - coated reinforcement treatment can be used plasma surface treatment. Under appropriate technological conditions such as PE, PP, PVF2, LDPE materials of low temperature plasma treatment, can significantly change the surface of the material form, usually is invisible to the naked eye change belongs to the nanometer level, introduced a variety of oxygen-containing groups, which changes the surface from the infinite, difficult to stick to a certain polarity, viscosity and hydrophilic, is advantageous to the materials of adhesive, coating and printing. This method has the advantages of simple process, convenient operation, fast processing speed, good treatment effect, little environmental pollution and energy saving. Plasma technology can improve the wetting rate and performance of plastic components. Plasma surface treatment technology with the method of integration of online, the plasma surface treatment machine spray on the surface of the cable, the cable surface pretreatment, make the surface tension of the cable surface get enough after pretreatment, under the condition of without changing insulation performance, the perfect adhesion force, so again during printing, inkjet, ink can be close to the insulation material surface, to achieve the ideal effect of printing, inkjet.

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